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Published TCIMAIL newest issue No.201

![Fabrication method and evaluation of vacuum-deposited [P2524]-based OFETs](/assets/cms-images/P2524-device-method-structure-en.png)

![Fabrication method and evaluation of vacuum-deposited [B5942]-based OFETs](/assets/cms-images/B5942-device-method-structure-en.png)

![Fabrication method and evaluation of vacuum-deposited [D5488]-based OFETs](/assets/cms-images/D5488-device-method-structure-en.png)

![Fabrication method and evaluation of vacuum-deposited [T2233]-based OFETs](/assets/cms-images/T2233-device-method-structure-en.png)

![Fabrication method and evaluation of Naphtacene [N1173]-based OFETs](/assets/cms-images/N1173-device-method-structure-en.png)

![Fabrication method and evaluation of vacuum-deposited [D5152]-based OFETs](/assets/cms-images/D5152-device-method-structure-en.png)

![Fabrication method and evaluation of vacuum-deposited [D3526]-based OFETs](/assets/cms-images/D3526-device-method-structure-en.png)

![Fabrication method and evaluation of vacuum-deposited [D5491]-based OFETs](/assets/cms-images/D5491-device-method-structure-en.png)

![Fabrication method and evaluation of vacuum-deposited [D4617]-based OFETs](/assets/cms-images/D4617-device-method-structure-en.png)

![Fabrication method and evaluation of vacuum-deposited [P2513]-based OFETs](/assets/cms-images/P2513-device-method-structure-en.png)

![Fabrication method and evaluation of vacuum-deposited [D4842]-based OFETs](/assets/cms-images/D4842-device-method-structure-en.png)

![Fabrication method and evaluation of vacuum-deposited [D4877]-based OFETs](/assets/cms-images/D4877-device-method-structure-en.png)

![Fabrication method and evaluation of vacuum-deposited [D4888]-based OFETs](/assets/cms-images/D4888-device-method-structure-en.png)

![Fabrication method and evaluation of vacuum-deposited [D4889]-based OFETs](/assets/cms-images/D4889-device-method-structure-en.png)

![Fabrication method and evaluation of vacuum-deposited [Q0079]-based OFETs](/assets/cms-images/Q0079-device-method-structure-en.png)

![Fabrication method and evaluation of vacuum-deposited [S0504]-based OFETs](/assets/cms-images/S0504-device-method-structure-en.png)

![Fabrication method and evaluation of vacuum-deposited [S0505]-based OFETs](/assets/cms-images/S0505-device-method-structure-en.png)

![Fabrication method and evaluation of vacuum-deposited [O0313]-based OFETs](/assets/cms-images/O0313-device-method-structure-en.png)

![Fabrication method and evaluation of vacuum-deposited [Q0083]-based OFETs](/assets/cms-images/Q0083-device-method-structure-en.png)

![Fabrication method and evaluation of vacuum-deposited [F1232]-based OFETs](/assets/cms-images/F1232-device-method-structure-en.png)

![Fabrication method and evaluation of vacuum-deposited [F1233]-based OFETs](/assets/cms-images/F1233-device-method-structure-en.png)

![Fabrication method and evaluation of vacuum-deposited [P2682]-based OFETs](/assets/cms-images/P2682-device-method-structure-en.png)

![Fabrication method and evaluation of vacuum-deposited [P2683]-based OFETs](/assets/cms-images/P2683-device-method-structure-en.png)

![Fabrication method and evaluation of vacuum-deposited [C2415]-based OFETs](/assets/cms-images/C2415-device-method-structure-en.png)

![Fabrication method and evaluation of vacuum-deposited [P2744]-based OFETs](/assets/cms-images/P2744-device-method-structure-en.png)

![Fabrication method and evaluation of (PEA)2SnI4 perovskite FET using PEAI [P2213] and SnI2 [T3449]](/assets/cms-images/PEA2SnI4-device-method-structure-en.png)