A photopolymer is a photosensitive, optically functional polymer material or resin whose properties, such as solubility, are altered by light irradiation. Photopolymers are widely used as photoresist materials during etching in the manufacture of printed circuits and semiconductor integrated circuits. In positive-type photoresist, photoacid generators (PAG) change the solubility of the photopolymer, whereas negative-type photoresist requires photopolymerization initiators for polymerization and curing. This section includes the monomers required to generate photopolymers.
Please also check Photopolymerization initiators.
Maintenance Notice in CEST time zone (1:00 - 4:00 AM April 19, 2026): The website is scheduled for maintenance. The website will be available, but some functions may experience errors. We appreciate your patience and understanding.
Published TCIMAIL newest issue No.201