Iodine-containing monomers are used in a wide range of applications, leveraging the X-ray absorption properties and halogen-bonding ability derived from iodine.
Due to iodine’s high atomic number, it efficiently absorbs X-rays in the energy range used for X-ray computed tomography (CT). As a result, iodine-containing monomers are utilized in the development of CT contrast materials.¹⁾ Furthermore, owing to the high atomic refraction of iodine, these monomers are also useful in the development of high-refractive-index materials.²⁾ In addition, they are applied in the development of molecularly imprinted polymers (MIPs) based on halogen bonding.^3,4) In recent years, their application in extreme ultraviolet (EUV) lithography-related materials has also been reported.^5,6)
Along with iodine-containing monomers, we also offer a diverse lineup of iodine-containing building blocks.

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Products (Iodine-containing Vinyl Monomers)

I1375

1-Iodo-4-vinylbenzene

D6520

2,6-Diiodo-4-vinylphenol

E1695

1,2,4,5-Tetrafluoro-3-iodo-6-vinylbenzene

T4361

2,4,6-Triiodophenyl Methacrylate

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Related Products (Iodine-containing Building Blocks)

H1958

4-(Hydroxymethyl)-2,6-diiodophenol

H1403

3-Hydroxy-2,4,6-triiodobenzoic Acid

H1960

4-Hydroxy-3-iodobenzaldehyde

I1313

4,4'-Sulfinylbis(iodobenzene)

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For information on other iodine-containing building blocks not listed above, please see the link below.

• Iodinated Phenol/Benzoic Acid/Benzaldehyde Building Blocks (Product Brochure PDF)
• Halogenated Hydrocarbons (Fluorides expected) [Non-Heterocyclic Building Blocks]

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Related Product Brochures

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Related Product Category Page

• Monomers

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References

1. 1) Organic Nanoplatforms for Iodinated Contrast Media in CT Imaging
   • P. Zhang, X. Ma, R. Guo, Z. Ye, H. Fu, N. Fu, Z. Guo, J. Zhang, J. Zhang, Molecules 2021, 26, 7063.
2. 2) Synthesis and Properties of High-Refractive-Index Iodine-Containing Polyacrylates
   • H. Maekawa, H. Amano, I. Nishina, H. Kudo, Chem. Select 2022, 7, e202201543.
3. 3) Molecularly Imprinted Polymers with Halogen Bonding-Based Molecular Recognition Sites
   • T. Takeuchi, Y. Minato, M. Takase, H. Shinmori, Tetrahedron Lett. 2005, 46, 9025.
4. 4) Rational Supramolecular Strategy via Halogen Bonding for Effective Halogen Recognition in Molecular Imprinting
   • E. Kanao, H. Osaki, T. Tanigawa, H. Takaya, T. Sano, J. Adachi, K. Otsuka, Y. Ishihama, T. Kubo, Anal. Chem. 2023, 95, 9304.
5. 5) Trends in Photoresist Materials for Extreme Ultraviolet Lithography: A Review
   • X. Wang, P. Tao, Q. Wang, R. Zhao, T. Liu, Y. Hu, Z. Hu, Y. Wang, J. Wang, Y. Tang, H. Xu, X. He, Mater. Today 2023, 67, 299.
6. 6) High Sensitivity Resists for EUV Lithography: A Review of Material Design Strategies and Performance Results
   • T. Manouras, P. Argitis, Nanomaterials 2020, 10, 1593.

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