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Fabrication and Evaluation of Organic Field-Effect Transistors (OFETs) : Naphthacene
Naphthacene [for organic electronics]
CAS RN: 92-24-0
Product Number: N1173
Performance of Naphthacene [N1173]-based OFETs
Table. OFETs Characteristics of Naphthacene [N1173]-based OFETs
Entry | Product Number | Fabrication Method | Device Configuration | SAM Treatment | Tsub (°C) | Polarity | μ (cm2 V−1 s−1) | Vth (V) | Ion/Ioff |
---|---|---|---|---|---|---|---|---|---|
Entry1 | Product NumberN1173 | Fabrication MethodVacuum Deposition | Device ConfigurationTCBG | SAM TreatmentBare | Tsub (°C)RT | Polarityp | μ(cm2 V−1 s−1)2.01×10-2 | Vth (V)-12.0 | Ion/Ioff105 |
Entry2 | Product NumberN1173 | Fabrication MethodDip-coating | Device ConfigurationTCBG | SAM TreatmentBare | Tsub (°C)RT | Polarityp | μ(cm2 V−1 s−1)4.08×10-2 | Vth (V)-17.1 | Ion/Ioff105 |

Figure. Transfer curves in the saturated region and output curves at different gate voltages
Experimental details
Fabrication and evaluation of Naphtacene [N1173]-based OFETs
< Substrate >
< Vacuum deposition >
< Dip-coating >
< Device Configuration >
< Evaluation Condition >
< Substrate >
- Bare Si/SiO2 (thickness of SiO2:200 nm)
< Vacuum deposition >
- Naphtacene [N1173]
Deposition rate: 1.0 Å/s
Thickness: 60 nm
Substrate temperature: RT (27°C)
Vacuum Pressure: ∼10−4 Pa - Au electrode
Deposition rate: 0.2 Å/s
Thickness: 40 nm
Substrate temperature: RT (27°C)
Vacuum Pressure: ∼10−5 Pa
< Dip-coating >
- Naphtacene [N1173]
Solution concentration: 0.5 mg/ml Chloroform
Pulling rate: 5 μm/sec
Stage temperature: 30°C
Experiment atmosphere: N2-filled glove box
< Device Configuration >
- [n+-Si/SiO (200 nm) / Naphtacene [N1173] / Au (40 nm)]
- Top-Contact Bottom-Gate Type (TCBG)
- Channel Length: 50 μm
- Channel width: 1.5 mm (Entry 1), 0.5mm (Entry 2)
< Evaluation Condition >
- Characteristics of OFET devices were measured in a nitrogen glove box after overnight storage.
- Field-effect mobilities (μ) were determined from the transfer curves in the saturation regime using the following equation:
ID = (W/2L) μ Ci (VG − Vth)2