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Fabrication and Evaluation of Organic Field-Effect Transistors (OFETs) : Naphthacene

Naphthacene [N1173]

Naphthacene [for organic electronics]
CAS RN: 92-24-0
Product Number: N1173

Performance of Naphthacene [N1173]-based OFETs

Fabrication method and evaluation of vacuum-deposited Naphthacene [N1173]



Table. OFETs Characteristics of Naphthacene [N1173]-based OFETs

Entry Product Number Fabrication Method Device Configuration SAM Treatment Tsub (°C) Polarity μ (cm2 V−1 s−1) Vth (V) Ion/Ioff
Entry1 Product NumberN1173 Fabrication MethodVacuum Deposition Device ConfigurationTCBG SAM TreatmentBare Tsub (°C)RT Polarityp μ(cm2 V−1 s−1)2.01×10-2 Vth (V)-12.0 Ion/Ioff105
Entry2 Product NumberN1173 Fabrication MethodDip-coating Device ConfigurationTCBG SAM TreatmentBare Tsub (°C)RT Polarityp μ(cm2 V−1 s−1)4.08×10-2 Vth (V)-17.1 Ion/Ioff105
Figure. Transfer curves in the saturated region

Figure. Transfer curves in the saturated region and output curves at different gate voltages


Experimental details

Fabrication and evaluation of Naphtacene [N1173]-based OFETs

< Substrate >
  • Bare Si/SiO2 (thickness of SiO2:200 nm)

< Vacuum deposition >
  • Naphtacene [N1173]
    Deposition rate: 1.0 Å/s
    Thickness: 60 nm
    Substrate temperature: RT (27°C)
    Vacuum Pressure: ∼10−4 Pa
  • Au electrode
    Deposition rate: 0.2 Å/s
    Thickness: 40 nm
    Substrate temperature: RT (27°C)
    Vacuum Pressure: ∼10−5 Pa

< Dip-coating >
  • Naphtacene [N1173]
    Solution concentration: 0.5 mg/ml Chloroform
    Pulling rate: 5 μm/sec
    Stage temperature: 30°C
    Experiment atmosphere: N2-filled glove box

< Device Configuration >
  • [n+-Si/SiO (200 nm) / Naphtacene [N1173] / Au (40 nm)]
  • Top-Contact Bottom-Gate Type (TCBG)
  • Channel Length: 50 μm
  • Channel width: 1.5 mm (Entry 1), 0.5mm (Entry 2)

< Evaluation Condition >
  • Characteristics of OFET devices were measured in a nitrogen glove box after overnight storage.
  • Field-effect mobilities (μ) were determined from the transfer curves in the saturation regime using the following equation:
    ID = (W/2L) μ Ci (VGVth)2

TCI products used in this experiment



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