A photopolymer is a photosensitive, optically functional polymer material or resin whose properties, such as solubility, are altered by light irradiation. Photopolymers are widely used as photoresist materials during etching in the manufacture of printed circuits and semiconductor integrated circuits. In positive-type photoresist, photoacid generators (PAG) change the solubility of the photopolymer, whereas negative-type photoresist requires photopolymerization initiators for polymerization and curing. This section includes the monomers required to generate photopolymers.
Please also check Photopolymerization initiators.
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| 제품번호 | H1689 |
| CAS RN | 115372-36-6 |
| 순도/분석 방법 | >99.0%(GC) |
| 제품번호 | A1735 |
| CAS RN | 121601-93-2 |
| 순도/분석 방법 | >98.0%(GC) |
![2-[(3r,5r,7r)-Adamantan-1-yl]propan-2-yl Methacrylate (stabilized with MEHQ)](/medias/Tci-300-A3633.jpg?context=bWFzdGVyfHJvb3R8MTY3MDZ8aW1hZ2UvanBlZ3xhR1F4TDJobE9DODVORFk1T0RJd01qY3lOamN3TDFSamFTMHpNREJmUVRNMk16TXVhbkJufDU2MTE0MDFiNGYzNzExZGViNzcwNDBkNDI5OTdhNWRlZWVlNjQ3MTViMzI1YmUxZjc3ODNmZjU2ZTMxM2E1Y2U "2-[(3r,5r,7r)-Adamantan-1-yl]propan-2-yl Methacrylate (stabilized with MEHQ)")
| 제품번호 | A3633 |
| CAS RN | 279218-76-7 |
| 순도/분석 방법 | >98.0%(GC) |
| 제품번호 | E1407 |
| CAS RN | 274248-09-8 |
| 순도/분석 방법 | >98.0%(GC) |
| 제품번호 | M0326 |
| CAS RN | 585-07-9 |
| 순도/분석 방법 | >98.0%(GC) |
| 제품번호 | M1526 |
| CAS RN | 16887-36-8 |
| 순도/분석 방법 | >98.0%(GC) |
| 제품번호 | M3223 |
| CAS RN | 249562-06-9 |
| 순도/분석 방법 | >98.0%(GC) |
| 제품번호 | M3228 |
| CAS RN | 178889-45-7 |
| 순도/분석 방법 | >98.0%(GC) |
| 제품번호 | M3261 |
| CAS RN | 178889-49-1 |
| 순도/분석 방법 | >98.0%(GC) |
| 제품번호 | M3676 |
| CAS RN | 1149760-04-2 |
| 순도/분석 방법 | >98.0%(GC) |
제품번호: H1689 |
순도/분석 방법
>99.0%(GC)
제품번호: A3633 |
순도/분석 방법
>98.0%(GC)
제품번호: M3676 |
순도/분석 방법
>98.0%(GC)
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